Sputtering Machine System Supplier | SELCOS

SELCOS Co., Ltd. has grown into a world-class company that will try unceasingly to be a modest, trustworthy, and passionate to its customers all over the world.

SELCOS is well recognized for its operational excellence of sputtering and coating-deposition process based on its proprietary high-vacuum thin-film technology and Nano-technology that is cultivated since its establishment in 2007. Its cutting-edge technology and system are specialized for depositing industrial thin film and for the display sputtering system as well as the large vacuum area distribution system. Its Nano-thin film coating process is suitable for the product development services and the alloy sputtering target. vacuum deposition machine supplier

SELCOS sputtering system of Inline Sputter, Cluster Sputter and Batch Sputter

Inline Sputter is a fully automated system. Its various technologies ensure stable quality and provide wide range of expandability. And it offers high mobility and maximizes the productivity. Inline Sputter applications are applicable to various thin films process (Metal, Oxide, and TCO), and also applicable to various products (Plastic, Glass), and applicable to various shapes (Deco, Tool, Special model).

Cluster Sputter is suitable for automated production lines and R&D systems. And it provides highly integrated technology and mechanisms. Cluster Sputter applications are applicable to various thin film process (metal, oxides, TCO), and applicable to highly integrated semiconductor and electronic component substrate processes, and also applicable to thin-film solar cell manufacturing processes.

Batch Sputter is a suitable system for R&D due to various thin-film deposition systems available. Batch Sputter applications are integrated optical devices, electronic components and Hardness Coating. eco friendly coating system

Specifications of Inline Sputter

ü  Configuration: Loading, Pre-treatment, Deposition, Buffer, Unloading

ü  Tact time: 3 min

ü  Cathode: Planar or Cylindrical Magnetron cathode

ü  Target: Metal, Oxide, TCO

Specifications of Cluster Sputter

ü  Configuration: Loading, Transfer, Pre-treatment, Deposition(PVD, CVD)

ü  Transfer: Hi-vacuum automatic robot

ü  Cathode: Planar or Round Magnetron cathode

ü  Target: Metal, Oxide, TCO

Specifications of Batch Sputter

ü  Configuration: Pre-treatment, Deposition

ü  Features: Drum type, Dual-side deposition

ü  Cathode: Planar Magnetron cathode

ü  Target: Metal, Oxide, TCO

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