Nano thin-film coating technology for wide applications |SELCOS

SELCOS co., Ltd. is well recognized for its operational excellence of sputtering and coating-deposition process based on its proprietary high-vacuum thin-film technology and Nano-technology that is cultivated since its establishment in 2007.

SELCOS has grown into a world-class company and will continue to try unceasingly to be modest, trustworthy, and passionate to its customers all over the world. vacuum deposition equipment

SELCOS has succeeded in delivery of multi-process OLED Evaporation System in 2016. Its cutting-edge technology and system are specialized for depositing industrial thin film as well as for the display sputtering system and the large vacuum area distribution system.

SELCOS Nano thin film coating process is suitable for the product development services and the alloy sputtering target.

SELCOS Nano thin film coating products furnish customers with Nano thin film deposition solutions for development, production, and even market creation. Through its thin-film material design and process simulations to meet customer needs, SELCOS provides an efficient and optimized layout and equipment system for the benefit of customers

Application of SELCOS Nano thin film coating products

ü  Research/Development Application

ü  Decorative coating Application

ü  Functional coating Application

ü  Special coating Application

Great Advantages of SELCOS Nano thin film coating products

ü  Vacuum coating total solution provided using design simulation, production, and processing

ü  Focus on maximizing efficiency and lowering investment costs

ü  Provide a variety of vacuum fusion technology and mechanisms

SELCOS alloy sputtering targets are self-made alloy targets for efficient and reliable cathode sputtering and supply organic/inorganic deposition sources and related components. sputtering system manufacturers

ü  Sputtering Cathode
Type: Planar, Round, Hexagon, Cylindrical type magnetron gun

ü  Size: up to 2,000mm

ü  Target Material: Metal, Oxide, and TCO

Sputtering Target

ü  Target Material: Metal (Silver, Gold, Titan Color)

Evaporation Source

ü  Type: Point cell, Linear cell

ü  Volume: Host and Dopant (from 3cc ~)

ü  Material: Organic and Inorganic material